Challenges of Gas Detection in Semiconductor Manufacturing.
In the era of nanoscale manufacturing processes, the accuracy of gas detection directly determines product yield and production costs.
Ultra-clean environment requirements
Semiconductor manufacturing has extremely high cleanliness requirements. ISO Class 1-5 cleanrooms require strict control of gaseous molecular contamination (AMC), as even a trace amount of contamination can lead to product defects.
Process gas purity
The impurity content of high-purity gases used in processes such as CVD, etching, and ion implantation must be controlled at the ppb or even ppt level to ensure process stability and product yield.
Real-time monitoring needs
Semiconductor production lines operate 24/7 without interruption, requiring real-time, continuous gas monitoring and zero-second response to promptly detect anomalies and ensure stable production.
Semiconductor process gases Monitoring solutions
Covering the entire wafer manufacturing process, ppb-level precision ensures process stability and product yield.
CHEMICAL VAPOR DEPOSITION
CVD化学气相沉积
Monitor the concentrations of precursor gases such as SiH₄, NH₃, N₂O, and TEOS to ensure the uniformity and quality of thin film deposition.
ION IMPLANTATION
离子注入
Monitor the concentrations of doping gases such as BF₃, PH₃, and AsH₃ to ensure doping uniformity and precise control.
ETCHING PROCESS
刻蚀工艺
Real-time monitoring of etching gases such as CF₄, SF₆, Cl₂, and BCl₃ allows for precise control of etching rate and selectivity.
LITHOGRAPHY PROCESS
光刻工艺
Monitor photoresist solvent vapors (PGMEA, EL, etc.) and developer vapors to ensure a safe process environment.
Full process
Process Coverage
Real time
Continuous monitoring
Intelligent
Abnormal alarm
Tracing
Data Records
50+
Types of gas detected
99.99%
System reliability
24/7
24/7 operation
0
Maintenance downtime